Park Systems,the AFM technology leader and preferred nanotechnology solutions partner, will exhibit at the MRS Fall 2010 in Boston, Massachusetts from Nov. 30th to Dec. 2nd. Please come and visit us at Booth 410 to learn our wide range of research AFM products. We will display the all new XE-100 Plus, the Park Systems’ flagship AFM, with a motorized sample stage for Step-and-Scan Automation and improved drift rates. Also, find out more about the XE-150, our premier cross-functional AFM with motorized sample stage, and the XE-Bio, our new AFM for live cell imaging with Ion Conductance Microscopy (ICM). All the XE-series of products feature artifact free imaging by Crosstalk Elimination (XE), True Non-Contact mode, and the ultimate in AFM resolution.
Dr. Sang-il Park, CEO and Chairman of Park Systems, will give an invited talk at the conference, entitled “The Crosstalk Eliminated (XE) Atomic Force Microscope and Advanced Nanotechnology Applications (Symposium VV 5.3, 2:15 PM, Nov. 30, 2010) ". His presentation will cover the one of the latest advancements in AFM industry which has been the Crosstalk Elimination in the XY scan where the XY flexure scanner is decoupled from the Z scanner to which a probe is attached. The design concept of the XE Technology is utilized to support specific advanced nanotechnology applications: a) under-cut measurement by intentionally changing the angle of the Z scanner thereby enabling sidewall roughness characterization in the nanoscale for the first time, and b) polymer pen lithography for low-cost, high throughput nanoscale patterning.Conference attendees will be able to learn XE Technology with decoupled XY and Z scanners and True Non-Contact Mode which provides unprecedented accuracy and reliability in nanoscale measurement.
Please click here to receive the invitation letter.